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Analytics - Bringing the hidden to light
Analytics - bringing the hidden to lightAs an leading
OEM supplier in the field of analytics we provide international OEM
customers with optical components and demanding assemblies and systems,
which make a vital contribution to the detailed examination of solid,
liquid and gaseous materials. For example: - Complex objectives
- Plano, concave and convex holographic gratings with high line density
In
order to fulfill state-of-the-art requirements and convince through
unique quality, many of our systems are manufactured and mounted in
clean rooms.
Engineering
Key components*
Material: optical glass, CaF2, MgF2, quartz, glassceramics, ceramic, borosilicate glass und filter glass Spherical lensesDimensions
| up to Ø 500 mm | | Radii | 1.2 mm upwards (without limit)
| Centering error
| 10" | Fitting error
| λ/40 PV, measured at 632.8 nm | Surface error
| 5/1 x 0.025
| Micro roughness
| 2 Å rms
| Average thickness tolerance
| +/- 3 µm | Diameter tolerance
| +/- 3 µm
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Aspherical lenses
Dimensions
| Ø 5 - 150 mm | Fitting error
| λ/20 PV, convex und concave, direct interferometric measurement
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Cylindrical lenses
Radii
| 2 - 50,000 mm | | Length | up to 500 mm, larger on request
| Lens width
| up to 300 mm (depending on the focal length) | Fitting error
| λ/8 PV, measured at 632.8 nm | Surface error
| 5/1 x 0.025 | Micro roughness
| 2 Å rms | Centering
| Rotation: 10", offset: 4 µm, wedge: 3µm |
Windows, prisms and prism systems Dimensions
| up to max. 1,500 mm | Flatness
| λ/40 PV, measured at 632.8 nm | | Parallelism | 1" | Angular accuracy
| 1" | Micr roughness
| 2 Å rms
| Surface defects
| 5/1 x 0.004 |
- Reticules, masks, coded and analog circles
- Structured coatings
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| Beam splitter/combiner (cemented/uncemented) | |
Assemblies Systems
- Optical assemblies and systems (cemented beam splitter, prim systems, doublets, triplets, step systems)
- Optomechanical assemblies and systems
- Elektro-optical systems
- Lens systems
- Objectives, zoom systems
- Measuring systems
- Cameras
- Laser systems
- Light sources
- Lighting systems
| Wavefront | Interferometer (4 - 24"), Shack-Hartmann wavefront sensor (UV, DUV, VIS, NIR) | Form deviation
| 3D coordinate measuring devices, calliper, CCD micrometers, Stitching interferometer | Angle precision
| Goniometer, interferometer, autocollimators | | Transmission/reflection | Spektral photometer | Surface defects
| Traveling microscopes
| Micro roughness
| White light interferometer, atomic force microscope | Imaging performance/resolution
| Computer-supported MTF-measurement, microscopic image resolution
| | Centering | Objective metrology system, laser centering station | Additional functional measurement
| Assembly-specific metrology station
| Fine correcting procedure
| Ionic beam process, robotic polishing, magnetorheological process
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*The following error and tolerance data indicates possible limit values. Specified and assessed according to ISO/MIL/DIN.
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